THERMAL-STRESS IN CVD PSG AND SIO2-FILMS ON SILICON SUBSTRATES

[1] CAMPBELL DS, 1970, HDB THIN FILM TECHNO, pCH12

[2] Iler R. K., 1955, COLLOID CHEM SILICA, Vvol. 80

[3] JACODINE RJ, 1966, J APPL PHYS, V37, P2429

[4] KERN W, 1976, RCA REV, V37, P55

[5] KERN W, 1976, RCA REV, V37, P3

[6] ADVANCES IN DEPOSITION PROCESSES FOR PASSIVATION FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (05): : 1082 - 1099

[7] CHARACTERIZATION OF OPTICAL THIN-FILMS [J]. APPLIED OPTICS, 1979, 18 (12): : 1969 - 1977

[8] PASSIVATION COATINGS ON SILICON DEVICES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (08) : 1092 - 1103

[9] SEREDA PJ, 1967, SOLID GAS INTERFACE, V2, P729

[10] TEMPERATURE-DEPENDENCE OF STRESSES IN CHEMICAL VAPOR-DEPOSITED VITREOUS FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (08) : 4197 - 4205

[1] CAMPBELL DS, 1970, HDB THIN FILM TECHNO, pCH12

[2] Iler R. K., 1955, COLLOID CHEM SILICA, Vvol. 80

[3] JACODINE RJ, 1966, J APPL PHYS, V37, P2429

[4] KERN W, 1976, RCA REV, V37, P55

[5] KERN W, 1976, RCA REV, V37, P3

[6] ADVANCES IN DEPOSITION PROCESSES FOR PASSIVATION FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (05): : 1082 - 1099

[7] CHARACTERIZATION OF OPTICAL THIN-FILMS [J]. APPLIED OPTICS, 1979, 18 (12): : 1969 - 1977

[8] PASSIVATION COATINGS ON SILICON DEVICES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (08) : 1092 - 1103

[9] SEREDA PJ, 1967, SOLID GAS INTERFACE, V2, P729

[10] TEMPERATURE-DEPENDENCE OF STRESSES IN CHEMICAL VAPOR-DEPOSITED VITREOUS FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (08) : 4197 - 4205