ON THE FLUENCE DEPENDENCE OF THE SPUTTERING YIELD FOR LOW-ENERGY NOBLE-GAS IONS

被引：17

作者：

KIRSCHNER, J

ETZKORN, HW

机构：

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1982年 / 29卷 / 03期

关键词：

D O I：

10.1007/BF00617769

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：133 / 139

页数：7

共 24 条

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