XECL EXCIMER LASER ABLATION OF A POLYETHERSULFONE FILM - DEPENDENCE OF PERIODIC MICROSTRUCTURES ON A POLARIZED BEAM

被引：28

作者：

NIINO, H ^{[1
]}

SHIMOYAMA, M ^{[1
]}

YABE, A ^{[1
]}

机构：

[1] EBARA RES CO LTD,FUJISAWA,KANAGAWA 251,JAPAN

来源：

APPLIED PHYSICS LETTERS | 1990年 / 57卷 / 22期

关键词：

D O I：

10.1063/1.103873

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Highly periodic stable microstructures appeared on the surface of polyethersulfone (PES) by XeCl excimer laser ablation with a single polarized beam in ambient air. Its formation mechanism was investigated using the time-resolved light scattering technique with the pulsed light of an XeF excimer laser. In addition to the polarization of the ablating beam, thermal processes on the etched surface play a significant role in microstructure formation.

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页码：2368 / 2370

页数：3

相关论文

共 15 条

[1] MORPHOLOGICAL-CHANGES OF THE SURFACE-STRUCTURE OF POLYMERS DUE TO EXCIMER LASER-RADIATION - A SYNERGETIC EFFECT [J].

BAHNERS, T ;

SCHOLLMEYER, E .

JOURNAL OF APPLIED PHYSICS, 1989, 66 (04) :1884-1886

[2] POLYMER FILM CUTTING AND ABLATIVE ETCHING USING A 1-KHZ XECL LASER [J].

BISHOP, GJ ;

DYER, PE .

APPLIED PHYSICS LETTERS, 1985, 47 (11) :1229-1231

[3] DIRECT-ETCHING STUDIES OF POLYMER-FILMS USING A 157-NM F2 LASER [J].

DYER, PE ;

SIDHU, J .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1986, 3 (05) :792-795

[4] PERIODIC SURFACE-STRUCTURES IN THE EXCIMER LASER ABLATIVE ETCHING OF POLYMERS [J].

DYER, PE ;

FARLEY, RJ .

APPLIED PHYSICS LETTERS, 1990, 57 (08) :765-767

[5] EXCIMER LASER ABLATION AND THERMAL COUPLING EFFICIENCY TO POLYMER-FILMS [J].

DYER, PE ;

SIDHU, J .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (04) :1420-1422

[6]

JENKINS F, 1957, FUNDAMENTALS OPTICS, P492

[7] INSTABILITIES AND PATTERN-FORMATION IN CRYSTAL-GROWTH [J].

LANGER, JS .

REVIEWS OF MODERN PHYSICS, 1980, 52 (01) :1-28

[8] ULTRAVIOLET-LASER PHOTOABLATION OF POLYMERS - A REVIEW AND RECENT RESULTS [J].

LAZARE, S ;

GRANIER, V .

LASER CHEMISTRY, 1989, 10 (01) :25-40

[9] PERIODIC MORPHOLOGICAL MODIFICATION DEVELOPED ON THE SURFACE OF POLYETHERSULFONE BY XECL EXCIMER LASER PHOTOABLATION [J].

NIINO, H ;

NAKANO, M ;

NAGANO, S ;

YABE, A ;

MIKI, T .

APPLIED PHYSICS LETTERS, 1989, 55 (05) :510-512

[10] SURFACE MORPHOLOGICAL MICROSTRUCTURES OF POLY(ETHYLENE 2,6-NAPHTHALATE) MODIFIED BY EXCIMER LASER ABLATION [J].

NIINO, H ;

YABE, A ;

NAGANO, S ;

MIKI, T .

APPLIED PHYSICS LETTERS, 1989, 54 (21) :2159-2161