共 9 条
- [2] CARSLAW HS, 1921, CONDUCTION HEAT
- [3] SELF-DEVELOPING UV PHOTORESIST USING EXCIMER LASER EXPOSURE [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) : 7201 - 7204
- [6] DIRECT HIGH-RESOLUTION EXCIMER LASER PHOTOETCHING [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1984, 33 (03): : 195 - 198
- [8] KINETICS OF THE ABLATIVE PHOTO-DECOMPOSITION OF ORGANIC POLYMERS IN THE FAR ULTRAVIOLET (193 NM) [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 923 - 926