INSULATION DEGRADATION AND ANOMALOUS ETCHING PHENOMENA IN SILICON-NITRIDE FILMS PREPARED BY PLASMA-ENHANCED DEPOSITION

被引：13

作者：

MAEDA, M

NAKAMURA, H

机构：

来源：

THIN SOLID FILMS | 1984年 / 112卷 / 03期

关键词：

D O I：

10.1016/0040-6090(84)90218-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：279 / 288

页数：10

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