HIGH-RESOLUTION ULTRAVIOLET PHOTOABLATION OF SIOX FILMS

被引：26

作者：

FIORI, C

DEVINE, RAB

机构：

来源：

APPLIED PHYSICS LETTERS | 1985年 / 47卷 / 04期

关键词：

D O I：

10.1063/1.96164

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：361 / 362

页数：2

共 15 条

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[4]

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[8]

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[9]

MCGRATH T, 1983, SOLID STATE TECHNOL, V26, P165

[10] ANNEALING CHARACTERISTICS OF SI-RICH SIO2-FILMS [J].

NESBIT, LA .

APPLIED PHYSICS LETTERS, 1985, 46 (01) :38-40

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