SOME PHOTOEFFECT ROLES IN RAPID ISOTHERMAL PROCESSING

被引:48
作者
SINGH, R [1 ]
SINHA, S [1 ]
THAKUR, RPS [1 ]
CHOU, P [1 ]
机构
[1] UNIV OKLAHOMA,SCH ELECT ENGN & COMP SCI,NORMAN,OK 73019
关键词
D O I
10.1063/1.104369
中图分类号
O59 [应用物理学];
学科分类号
摘要
When compared to furnace processing, for identical and lower substrate temperatures, more photons are available in the visible and ultraviolet regions for rapid isothermal processing (RIP) based on incoherent radiation as the energy source. In this letter, we provide experimental evidence for photoeffects in RIP for a wide variety of materials. As compared to furnace processed samples, rapid isothermal annealed phosphosilicate glass films on Si substrate show a higher value of refractive index, a lower flatband charge density, and a lower thermal stress. High-temperature superconducting thin films on Y-Ba-Cu-O deposited by RIP assisted metalorganic chemical vapor deposition on yttrium stabilized zirconia substrate show a larger grain size, a higher value of the transition temperature than their furnace counterpart. The microscopic understanding of a particular deposition or annealing process is necessary to take full advantage of photoeffects in RIP.
引用
收藏
页码:1217 / 1219
页数:3
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