SYNCHROTRON RADIATION-INDUCED CHEMICAL VAPOR-DEPOSITION OF THIN-FILMS FROM METAL HEXACARBONYLS

被引:29
作者
MANCINI, DC
VARMA, S
SIMONS, JK
ROSENBERG, RA
DOWBEN, PA
机构
[1] SYRACUSE UNIV,DEPT PHYS,SYRACUSE,NY 13244
[2] UNIV WISCONSIN,DEPT CHEM,MADISON,WI 53706
[3] UNIV WISCONSIN,CTR SYNCHROTRON RADIAT,STOUGHTON,WI 53589
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 06期
关键词
D O I
10.1116/1.585163
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have studied the initial stages of synchroton radiation [SR] induced chemical vapor deposition [CVD] of metal-containing thin films from metal hexacarbonyl gases. We have measured the dependence of the initial deposition rate upon gas pressure at room temperature. Substrates were exposed to SR for single fills of the electron storage ring at constant pressure of Mo(CO)6, Cr(CO)6, or W(CO)6 gas. Deposition was monitored in situ by Auger electron spectroscopy using the SR as the excitation source. The presence of metal, carbon, and oxygen in the deposited films was observed, and the results are consistent with previous studies. Deposition was found to be isolated to areas of the substrate exposed to the SR beam. We discuss these results as they relate to the use of SR as a means to induce CVD and the possibility of patterned deposition using a masked SR source.
引用
收藏
页码:1804 / 1807
页数:4
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