AN EXPERIMENTAL SYSTEM FOR SURFACE-REACTION STUDIES IN MICROWAVE PLASMA-ETCHING

被引：45

作者：

NINOMIYA, K

SUZUKI, K

NISHIMATSU, S

GOTOH, Y

OKADA, O

机构：

[1] Hitachi Ltd, Central Research Lab,, Kokubunji, Jpn, Hitachi Ltd, Central Research Lab, Kokubunji, Jpn

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1984年 / 2卷 / 04期

关键词：

D O I：

10.1116/1.582856

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

INTEGRATED CIRCUIT MANUFACTURE

引用

页码：645 / 652

页数：8

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