X-RAY PHOTOELECTRON-SPECTROSCOPY INVESTIGATION OF ION-BEAM SPUTTERED INDIUM TIN OXIDE-FILMS AS A FUNCTION OF OXYGEN-PRESSURE DURING DEPOSITION

被引：63

作者：

NELSON, AJ ^{[1
]}

AHARONI, H ^{[1
]}

机构：

[1] BEN GURION UNIV NEGEV,DEPT ELECT & COMP ENGN,BEER SHEVA,ISRAEL

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 02期

关键词：

D O I：

10.1116/1.574109

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：231 / 233

页数：3

共 10 条

[1] ION-BEAM SPUTTERED INDIUM TIN OXIDE FOR INP SOLAR-CELLS
AHARONI, H
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GESSERT, T
DHERE, R
SCHILLING, L
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 428 - 431
[2] TRANSPARENT CONDUCTORS - A STATUS REVIEW
CHOPRA, KL
MAJOR, S
PANDYA, DK
[J]. THIN SOLID FILMS, 1983, 102 (01) : 1 - 46
[3] EFFECT OF O2 PRESSURE DURING DEPOSITION ON PROPERTIES OF RF-SPUTTERED SN-DOPED IN2O3 FILMS
FAN, JCC
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FOLEY, GH
[J]. APPLIED PHYSICS LETTERS, 1977, 31 (11) : 773 - 775
[4] X-RAY PHOTOEMISSION SPECTROSCOPY STUDIES OF SN-DOPED INDIUM-OXIDE FILMS
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[J]. JOURNAL OF APPLIED PHYSICS, 1977, 48 (08) : 3524 - 3531
[5] EFFECTS OF HEAT-TREATMENT ON OPTICAL AND ELECTRICAL-PROPERTIES OF INDIUM-TIN OXIDE-FILMS
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[J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (01) : 304 - 307
[6] THE INFLUENCE OF THE PREPARATION ON LAYER PROPERTIES OF TRANSPARENT INDIUM TIN OXIDE ELECTRODES
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HECKNER, KH
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LADWIG, H
[J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1982, 74 (01): : 133 - 139
[7] ELECTRICAL-PROPERTIES OF POST-OXIDIZED IN2O3-SN FILMS
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[J]. THIN SOLID FILMS, 1981, 76 (02) : 97 - 105
[8] ELECTRICAL-PROPERTIES OF VACUUM-DEPOSITED INDIUM OXIDE AND INDIUM TIN OXIDE-FILMS
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[J]. THIN SOLID FILMS, 1980, 70 (01) : 91 - 100
[9] EFFECTS OF HEAT-TREATMENT ON INDIUM-TIN OXIDE-FILMS
SMITH, FTJ
LYU, SL
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (11) : 2388 - 2394
[10] OPTICAL AND ELECTRICAL-PROPERTIES OF RF-SPUTTERED INDIUM TIN OXIDE-FILMS
SZCZYRBOWSKI, J
DIETRICH, A
HOFFMANN, H
[J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1983, 78 (01): : 243 - 252

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