INFRARED, RAMAN, AND X-RAY-DIFFRACTION STUDIES OF SILICON-OXIDE FILMS FORMED FROM SIH4 AND N2O CHEMICAL VAPOR-DEPOSITION

被引:50
作者
NAKAMURA, M [1 ]
MOCHIZUKI, Y [1 ]
USAMI, K [1 ]
ITOH, Y [1 ]
NOZAKI, T [1 ]
机构
[1] RIKAGAKU KENKYUSHO,WAKO,SAITAMA 351,JAPAN
关键词
D O I
10.1149/1.2113868
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:482 / 488
页数:7
相关论文
共 27 条
[1]   EFFECT OF STATIC UNIAXIAL STRESS ON RAMAN SPECTRUM OF SILICON [J].
ANASTASSAKIS, E ;
PINCZUK, A ;
BURSTEIN, E ;
POLLAK, FH ;
CARDONA, M .
SOLID STATE COMMUNICATIONS, 1970, 8 (02) :133-+
[2]   EFFECTS OF INTERBAND EXCITATIONS ON RAMAN PHONONS IN HEAVILY DOPED N-SI [J].
CHANDRASEKHAR, M ;
RENUCCI, JB ;
CARDONA, M .
PHYSICAL REVIEW B, 1978, 17 (04) :1623-1633
[3]  
DIAMARIA DJ, 1979, J APPL PHYS, V50, P5826
[4]   DETERMINATION OF EXISTING STRESS IN SILICON FILMS ON SAPPHIRE SUBSTRATE USING RAMAN-SPECTROSCOPY [J].
ENGLERT, T ;
ABSTREITER, G ;
PONTCHARRA, J .
SOLID-STATE ELECTRONICS, 1980, 23 (01) :31-33
[5]   CRYSTALLOGRAPHIC STUDY OF SEMI-INSULATING POLYCRYSTALLINE SILICON (SIPOS) DOPED WITH OXYGEN-ATOMS [J].
HAMASAKI, M ;
ADACHI, T ;
WAKAYAMA, S ;
KIKUCHI, M .
JOURNAL OF APPLIED PHYSICS, 1978, 49 (07) :3987-3992
[6]   ELECTRONIC PROPERTIES OF SEMI-INSULATING POLYCRYSTALLINE-SILICON (SIPOS) DOPED WITH OXYGEN-ATOMS [J].
HAMASAKI, M ;
ADACHI, T ;
WAKAYAMA, S ;
KIKUCHI, M .
SOLID STATE COMMUNICATIONS, 1977, 21 (06) :591-593
[7]   OBSERVATION OF AMORPHOUS-SILICON REGIONS IN SILICON-RICH SILICON DIOXIDE FILMS [J].
HARTSTEIN, A ;
TSANG, JC ;
DIMARIA, DJ ;
DONG, DW .
APPLIED PHYSICS LETTERS, 1980, 36 (10) :836-837
[8]   RAMAN-SCATTERING FROM SMALL PARTICLE-SIZE POLYCRYSTALLINE SILICON [J].
IQBAL, Z ;
VEPREK, S ;
WEBB, AP ;
CAPEZZUTO, P .
SOLID STATE COMMUNICATIONS, 1981, 37 (12) :993-996
[9]   ON THE NATURE OF CVD SI-RICH SIO2 AND SI3N4 FILMS [J].
IRENE, EA ;
CHOU, NJ ;
DONG, DW ;
TIERNEY, E .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (11) :2518-2521
[10]  
KANELLIS G, 1980, PHYS REV B, V21, P1534