ON THE NATURE OF CVD SI-RICH SIO2 AND SI3N4 FILMS

被引：35

作者：

IRENE, EA

CHOU, NJ

DONG, DW

TIERNEY, E

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 11期

关键词：

D O I：

10.1149/1.2129507

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2518 / 2521

页数：4

共 13 条

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