ON THE IDENTIFICATION OF INTERFACE OXIDES AND INTERFACE SERRATION BY ARXPS

被引：11

作者：

DARLINSKI, A ^{[1
]}

HALBRITTER, J ^{[1
]}

机构：

[1] KERNFORSCHUNGSZENTRUM KARLSRUHE GMBH,INST KERNPHYSIK 2,POSTFACH 3640,D-7500 KARLSRUHE 1,FED REP GER

来源：

FRESENIUS ZEITSCHRIFT FUR ANALYTISCHE CHEMIE | 1987年 / 329卷 / 2-3期

关键词：

D O I：

10.1007/BF00469154

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：266 / 271

页数：6

共 16 条

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[9] LOCAL ATOMIC AND ELECTRONIC-STRUCTURE OF OXIDE-GAAS AND SIO2-SI INTERFACES USING HIGH-RESOLUTION XPS [J].

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