ALUMINUM EPITAXY ON SI(111) AND SI(100) USING AN IONIZED CLUSTER BEAM

被引：15

作者：

YAMADA, I

INOKAWA, H

TAKAGI, T

机构：

来源：

THIN SOLID FILMS | 1985年 / 124卷 / 3-4期

关键词：

D O I：

10.1016/0040-6090(85)90263-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

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页码：179 / 184

页数：6

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