CURRENT TRANSPORT ACROSS A GRAIN-BOUNDARY IN POLYCRYSTALLINE SEMICONDUCTORS

被引:17
作者
LU, CY [1 ]
LU, NCC [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
关键词
D O I
10.1016/0038-1101(83)90170-3
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:549 / 557
页数:9
相关论文
共 39 条
[1]  
ALONSO M, 1973, QUANTUM MECH PRINCIP, P181
[2]   TRANSPORT PROPERTIES OF POLYCRYSTALLINE SILICON FILMS [J].
BACCARANI, G ;
RICCO, B ;
SPADINI, G .
JOURNAL OF APPLIED PHYSICS, 1978, 49 (11) :5565-5570
[3]  
BOARD K, 1981, J APPL PHYS, V51, P4546
[4]   STUDIES OF TUNNEL MOS DIODES .1. INTERFACE EFFECTS IN SILICON SCHOTTKY DIODES [J].
CARD, HC ;
RHODERICK, EH .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1971, 4 (10) :1589-+
[5]  
CARNAHAN B, 1969, APPLIED NUMERICAL ME, P361
[6]   CHEMICAL VAPOR DEPOSITED POLYCRYSTALLINE SILICON. [J].
Cowher, M.E. ;
Sedgwick, T.O. .
1600, (119)
[7]   QUANTUM-MECHANICAL REFLECTION OF ELECTRONS AT METAL-SEMICONDUCTOR BARRIERS - ELECTRON TRANSPORT IN SEMICONDUCTOR-METAL-SEMICONDUCTOR STRUCTURES [J].
CROWELL, CR ;
SZE, SM .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (07) :2683-&
[8]   RICHARDSON CONSTANT AND TUNNELING EFFECTIVE MASS FOR THERMIONIC AND THERMIONIC-FIELD EMISSION IN SCHOTTKY BARRIER DIODES [J].
CROWELL, CR .
SOLID-STATE ELECTRONICS, 1969, 12 (01) :55-&
[9]   CURRENT TRANSPORT IN METAL SEMICONDUCTOR CONTACTS - UNIFIED APPROACH [J].
FONASH, SJ .
SOLID-STATE ELECTRONICS, 1972, 15 (07) :783-&
[10]  
GERZBERG L, 1981, IEEE ISSCC DIG TECH, P164