NANOWRITER - A NEW HIGH-VOLTAGE ELECTRON-BEAM LITHOGRAPHY SYSTEM FOR NANOMETER-SCALE FABRICATION

被引：24

作者：

CHEN, ZW

JONES, GAC

AHMED, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584119

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2009 / 2013

页数：5

共 9 条

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[5] AN E-BEAM MICROFABRICATION SYSTEM FOR NANOLITHOGRAPHY
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[8] OHIWA H, 1971, ELECTRON COMMUN JP B, V54
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