ELECTRON-BEAM LITHOGRAPHY FROM 20 TO 120 KEV WITH A HIGH-QUALITY BEAM

被引：40

作者：

HOWARD, RE ^{[1
]}

CRAIGHEAD, HG ^{[1
]}

JACKEL, LD ^{[1
]}

MANKIEWICH, PM ^{[1
]}

FELDMAN, M ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.582642

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1101 / 1104

页数：4

共 12 条

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[8]

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