LASER-INDUCED CVD OF TITANIUM DIBORIDE AND THE INFLUENCE OF ATOMIC-HYDROGEN

被引：8

作者：

ELDERS, J

VANVOORST, JDW

机构：

[1] Laboratory for Physical Chemistry, University of Amsterdam, 1018 ZW Amsterdam

来源：

APPLIED SURFACE SCIENCE | 1993年 / 69卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(93)90516-E

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

CO2 laser-induced chemical vapor deposition of titanium diboride (TiB2) has been performed on mullite substrates by the hydrogen reduction of titanium tetrachloride and boron trichloride. The influence of the hydrogen concentration on the morphology, growth rate and nucleation rate will be discussed. These results suggest that atomic hydrogen may play an important role in the deposition process. An atomic hydrogen source, a hot filament, has therefore been constructed. The results of the hot filament-enhanced depositions on thermally oxidized silicon will be presented.

引用

页码：267 / 271

页数：5

共 9 条

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