OPTICAL CONTROL OF GAASSB INGAAS STAGGERED RESONANT TUNNELING BARRIER STRUCTURES GROWN BY MBE

被引:2
作者
INATA, T
NAKATA, Y
MUTO, S
机构
[1] Fujitsu Labs. Ltd., Kanagawa
关键词
D O I
10.1088/0268-1242/7/3B/121
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A GaAsSb(8.50 nm)/InGaAs(4.40 nm)/InAlAs(5.27 nm) staggered resonant tunnelling barrier structure, lattice-matched to InP, has been grown by MBE and a strong illumination effect on its current-voltage characteristics has been observed at room temperature. The peak current density increased by 40% and the peak voltage shifted by -75mV at an excitation power density of 30 W cm-2. We attributed these effects to the holes accumulated in the GaAsSb layer which acts as a deep quantum well, trapping the holes.
引用
收藏
页码:B465 / B467
页数:3
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