COMPARISON OF ADAMANTANE AND FLUORITE NISI2

被引：11

作者：

LEE, W

BYLANDER, DM

KLEINMAN, L

机构：

来源：

PHYSICAL REVIEW B | 1985年 / 32卷 / 10期

关键词：

D O I：

10.1103/PhysRevB.32.6899

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：6899 / 6901

页数：3

共 13 条

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CHIAO, LW
TU, KN
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[4] SELF-CONSISTENT ENERGY-BANDS AND BONDING OF NISI2
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KLEINMAN, L
MEDNICK, K
GRISE, WR
[J]. PHYSICAL REVIEW B, 1982, 26 (12): : 6379 - 6383
[5] DIFFUSION LAYERS AND THE SCHOTTKY-BARRIER HEIGHT IN NICKEL SILICIDE-SILICON INTERFACES
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ERSKINE, JL
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[6] DIFFUSION-LAYER MICROSTRUCTURE OF NI ON SI(100)
CHANG, YJ
ERSKINE, JL
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[7] 1ST-PRINCIPLES LINEAR COMBINATION OF ATOMIC ORBITALS METHOD FOR THE COHESIVE AND STRUCTURAL-PROPERTIES OF SOLIDS - APPLICATION TO DIAMOND
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LOUIE, SG
[J]. PHYSICAL REVIEW B, 1984, 29 (06): : 3470 - 3481
[8] LATTICE-LOCATION EXPERIMENT OF THE NI-SI INTERFACE BY THIN-CRYSTAL CHANNELING OF HELIUM-IONS
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MAYER, JW
[J]. PHYSICAL REVIEW LETTERS, 1981, 46 (10) : 671 - 674
[9] Hamann D. R., UNPUB
[10] HAMANN DR, 1985, B AM PHYS SOC, V30, P592