MICROWAVE PLASMA GENERATION OF ARSINE FROM HYDROGEN AND SOLID ARSENIC

被引:8
作者
OMSTEAD, TR [1 ]
ANNAPRAGADA, AV [1 ]
JENSEN, KF [1 ]
机构
[1] UNIV MINNESOTA,DEPT CHEM ENGN,MINNEAPOLIS,MN 55455
关键词
D O I
10.1063/1.104182
中图分类号
O59 [应用物理学];
学科分类号
摘要
The generation of arsine from the reactions of hydrogen and elemental arsenic in a microwave plasma reactor is described. The arsenic is evaporated from a solid source upstream and carried into the microwave plasma region by a mixture of hydrogen and argon. Stable reaction products, arsine and diarsine are observed by molecular beam sampled mass spectroscopy along with partially hydrogenated species (e.g., AsH and AsH2). The effect of composition and flow rate of the argon/hydrogen carrier gas mixture on the amount of arsine generated is investigated. The arsine production reaches a maximum for an argon-to-hydrogen ratio of unity indicating that metastable argon species act as energy transfer intermediates in the overall reaction. The generation of arsine and diarsine from easily handled solid arsenic by this technique makes it attractive as a possible arsenic source for the growth of compound semiconductors by low-pressure metalorganic chemical vapor deposition.<lz> <lz> <lz> <lz> <lz>.
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收藏
页码:2543 / 2545
页数:3
相关论文
共 17 条
[1]   OMCVD GROWTH OF GAAS AND ALGAAS USING A SOLID AS SOURCE [J].
BHAT, R .
JOURNAL OF ELECTRONIC MATERIALS, 1985, 14 (04) :433-449
[2]   GROWTH OF HIGH-QUALITY GAAS USING TRIMETHYLGALLIUM AND DIETHYLARSINE [J].
BHAT, R ;
KOZA, MA ;
SKROMME, BJ .
APPLIED PHYSICS LETTERS, 1987, 50 (17) :1194-1196
[3]  
BRAUERS A, 1988, J CRYST GROWTH, V93, P52
[4]   EPITAXIAL-GROWTH OF HIGH-MOBILITY GAAS USING TERTIARYBUTYLARSINE AND TRIETHYLGALLIUM [J].
HAACKE, G ;
WATKINS, SP ;
BURKHARD, H .
APPLIED PHYSICS LETTERS, 1990, 56 (05) :478-480
[5]   SOLID ARSENIC HYDRIDES [J].
JOLLY, WL ;
ANDERSON, LB ;
BELTRAMI, RT .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1957, 79 (10) :2443-2447
[6]   REACTIONS OF C+,HE+, AND NE+ WITH VIBRATIONALLY EXCITED H-2 AND D2 [J].
JONES, ME ;
BARLOW, SE ;
ELLISON, GB ;
FERGUSON, EE .
CHEMICAL PHYSICS LETTERS, 1986, 130 (03) :218-223
[7]   SILICON DOPING OF GAAS AND ALXGA1-XAS USING DISILANE IN METALORGANIC CHEMICAL VAPOR-DEPOSITION [J].
KUECH, TF ;
VEUHOFF, E ;
MEYERSON, BS .
JOURNAL OF CRYSTAL GROWTH, 1984, 68 (01) :48-53
[8]   INSITU MASS-SPECTROSCOPY AND THERMOGRAVIMETRIC STUDIES OF GAAS MOCVD GAS-PHASE AND SURFACE-REACTIONS [J].
LEE, PW ;
OMSTEAD, TR ;
MCKENNA, DR ;
JENSEN, KF .
JOURNAL OF CRYSTAL GROWTH, 1987, 85 (1-2) :165-174
[9]   EFFECTS OF METHYLARSINE HOMOLOGS (CH3)NASH3-N ON THE METALORGANIC VAPOR-PHASE EPITAXY OF GAAS [J].
LUM, RM ;
KLINGERT, JK ;
KISKER, DW .
JOURNAL OF APPLIED PHYSICS, 1989, 66 (02) :652-655
[10]   COMPARISON OF ALTERNATE AS-SOURCES TO ARSINE IN THE MOCVD GROWTH OF GAAS [J].
LUM, RM ;
KLINGERT, JK ;
LAMONT, MG .
JOURNAL OF CRYSTAL GROWTH, 1988, 89 (01) :137-142