ION-IMPLANTATION CHANGE IN THE CHEMICAL-STRUCTURE OF A RESIST

被引：19

作者：

FUJIMURA, S ^{[1
]}

YANO, H ^{[1
]}

KONNO, J ^{[1
]}

机构：

[1] FUJITSU LABS LTD,DIV BIPOLAR,NAKAHARA KU,KAWASAKI,KANAGAWA 211,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 39卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(89)90902-6

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：809 / 812

页数：4

共 10 条

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