SOME USEFUL YIELD ESTIMATES FOR ION-BEAM SPUTTERING AND ION PLATING AT LOW BOMBARDING ENERGIES

被引：55

作者：

ZALM, PC

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1984年 / 2卷 / 02期

关键词：

D O I：

10.1116/1.582936

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：151 / 152

页数：2

共 17 条

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