CHEMICAL AND PHYSICAL ROLES OF INDIVIDUAL REACTIVE IONS IN SI DRY ETCHING

被引：47

作者：

TACHI, S

MIYAKE, K

TOKUYAMA, T

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1982年 / 21卷 / 01期

关键词：

D O I：

10.7567/JJAPS.21S1.141

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：141 / 146

页数：6

共 10 条

[1] DRY PROCESS TECHNOLOGY (REACTIVE ION ETCHING) [J].

BONDUR, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (05) :1023-1029

[2] ION-SURFACE INTERACTIONS IN PLASMA ETCHING [J].

COBURN, JW ;

WINTERS, HF ;

CHUANG, TJ .

JOURNAL OF APPLIED PHYSICS, 1977, 48 (08) :3532-3540

[3] DIRECT COLLECTION OF SOME METAL IONS IN AN ELECTROMAGNETIC ISOTOPE SEPARATOR AND RELATED SURFACE EFFECTS [J].

FONTELL, A ;

ARMINEN, E .

CANADIAN JOURNAL OF PHYSICS, 1969, 47 (21) :2405-&

[4]

FRIESER RG, 1981, PLASMA PROCESSING

[5] DETERMINATION OF ENERGY-LEVEL SHIFTS WHICH ACCOMPANY CHEMISORPTION [J].

HAGSTRUM, HD .

SURFACE SCIENCE, 1976, 54 (02) :197-209

[6] ABSOLUTE CROSS-SECTIONS FOR BEAM-SURFACE REACTIONS - N-2+ ON TI FROM 0.25 TO 3.0 KEV KINETIC-ENERGY [J].

HU, HK ;

MURRAY, PT ;

FUKUDA, Y ;

RABALAIS, JW .

JOURNAL OF CHEMICAL PHYSICS, 1981, 74 (04) :2247-2255

[7] ROLES OF IONS AND NEUTRAL ACTIVE SPECIES IN MICROWAVE PLASMA-ETCHING [J].

SUZUKI, K ;

OKUDAIRA, S ;

KANOMATA, I .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (06) :1024-1028

[8]

TACHI S, 1981, JPN J APPL PHYS, V41, pL411

[9] LOW-ENERGY MASS-SEPARATED ION-BEAM DEPOSITION OF MATERIALS [J].

TOKUYAMA, T ;

YAGI, K ;

MIYAKE, K ;

TAMURA, M ;

NATSUAKI, N ;

TACHI, S .

NUCLEAR INSTRUMENTS & METHODS, 1981, 182 (APR) :241-250

[10]

YAGI K, 1978, I PHYS C SER, V38, P136

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