GLOW-DISCHARGE OPTICAL SPECTROSCOPY AS AN ANALYTICAL DEPTH PROFILING TECHNIQUE

被引：17

作者：

GREENE, JE

SEQUEDAOSORIO, F

NATARAJAN, BR

机构：

[1] UNIV ILLINOIS,DEPT MET,URBANA,IL 61801

[2] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 01期

关键词：

D O I：

10.1116/1.568792

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：366 / 369

页数：4

相关论文

共 20 条

[1] SPECTROSCOPIC MONITOR FOR SPUTTER-ETCHING PROCESSES
BERNSTEIN, T
LABUDA, EF
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01): : 108 - 110
[2] IONIZATION-ENHANCED DIFFUSION - ION-IMPLANTATION IN SEMICONDUCTORS
BOURGOIN, J
PEAK, D
CORBETT, JW
[J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (07) : 3022 - 3027
[3] Carter G., 1968, ION BOMBARDMENT SOLI
[4] GLOW-DISCHARGE MASS-SPECTROMETRY - TECHNIQUE FOR DETERMINING ELEMENTAL COMPOSITION PROFILES IN SOLIDS
COBURN, JW
TAGLAUER, E
KAY, E
[J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (04) : 1779 - 1786
[5] CROWDER BL, 1973, P INT C ION IMPLANTA
[6] APPLICATION OF ION MICROPROBE ANALYZER TO MEASUREMENT OF DISTRIBUTION OF BORON IONS IMPLANTED INTO SILICON CRYSTALS
GITTINS, RP
DEARNALEY, G
MORGAN, DV
[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1972, 5 (09) : 1654 - +
[7] GLOW-DISCHARGE OPTICAL SPECTROSCOPY FOR MONITORING SPUTTER DEPOSITED FILM THICKNESS
GREENE, JE
SEQUEDAO.F
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06): : 1144 - 1149
[8] GLOW-DISCHARGE OPTICAL SPECTROSCOPY FOR ANALYSIS OF THIN-FILMS
GREENE, JE
WHELAN, JM
[J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (06) : 2509 - 2513
[9] MEASUREMENT OF BORON IMPURITY PROFILES IN SI USING GLOW-DISCHARGE OPTICAL SPECTROSCOPY
GREENE, JE
SEQUEDAO.F
STREETMAN, BG
NOONAN, JR
KIRKPATRICK, CG
[J]. APPLIED PHYSICS LETTERS, 1974, 25 (08) : 435 - 440
[10] GREENE JE, 1970, B AM PHYS SOC, V15, P1614