THE EVOLUTION OF ATOMIC SCALE TOPOGRAPHY BY SPUTTERING EROSION

被引：16

作者：

CARTER, G ^{[1
]}

NOBES, MJ ^{[1
]}

STOERE, H ^{[1
]}

KATARDJIEV, IV ^{[1
]}

机构：

[1] UNIV UPPSALA,SCH ENGN,DEPT TECHNOL,S-75121 UPPSALA,SWEDEN

来源：

SURFACE AND INTERFACE ANALYSIS | 1993年 / 20卷 / 01期

关键词：

D O I：

10.1002/sia.740200113

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A numerical simulation of mediated random removal of atoms from a square array is presented. The removal probability is weighted according to the local surface orientation in order to model the effect of orientation-dependent sputtering yield and it is demonstrated that this results in greatly reduced surface roughness development. This implies improved depth resolution in sputter depth profiling over that predicted from equal probability random atomic removal processes.

引用

页码：90 / 94

页数：5

共 20 条

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