OXIDATION TEMPERATURE-DEPENDENCE OF THE DC ELECTRICAL-CONDUCTION CHARACTERISTICS AND DIELECTRIC STRENGTH OF THIN TA2O5 FILMS ON SILICON

被引：110

作者：

OEHRLEIN, GS

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 59卷 / 05期

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D O I：

10.1063/1.336468

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：1587 / 1595

页数：9

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