LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION AT QUASI-HIGH FLOW

被引：6

作者：

HOLLEMAN, J

MIDDELHOEK, J

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(84)90127-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：295 / 309

页数：15

共 8 条

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[6]

ROSLER RS, 1977, SOLID STATE TECHNOL, V20, P63

[7] LOW-PRESSURE DEPOSITION OF POLYCRYSTALLINE SILICON FROM SILANE [J].

VANDENBREKEL, CHJ ;

BOLLEN, LJM .

[8]

Yasuda Y., 1974, J JAP SOC APPL PHYS, V43, P400