DEVELOPMENTS IN LUMINESCENT POROUS SI

被引:97
作者
JUNG, KH [1 ]
SHIH, S [1 ]
KWONG, DL [1 ]
机构
[1] UNIV TEXAS, DEPT ELECT & COMP ENGN, MICROELECTR RES CTR, AUSTIN, TX 78712 USA
关键词
D O I
10.1149/1.2220955
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The recent observation of room temperature photoluminescence (PL) from porous Si layers (PSLs) has received considerable attention. Bulk crystalline Si does not luminesce efficiently at room temperature due to the indirect nature of the energy bandgap minimum. The PL from PSLs has been attributed to quantum confinement effects in nanometer-sized crystalline features found in PSLs, typically of high porosity. In this paper, we review some of the major results and the controversies of subsequent research. The basic methods of fabricating luminescent PSLS are described, including conventional anodic etching and chemical etching. The latter technique requires no applied bias, but is modeled as an electrochemical process. Other processing issues are also addressed, particularly with respect to postanodization control of the PL spectrum. Microscopic and spectroscopic studies of the material and optical characteristics of PSLs fabricated by the various techniques are presented and discussed. The basic models of the luminescence mechanism are described, including quantum-sized crystalline Si, surface passivation, Si-H(x) allows, and molecular electronics. These models are discussed in terms of the supporting and contradicting evidence. Electroluminescence (EL) studies are discussed, including EL from anodic oxidation of PSLs as well as from light-emitting diodes. The results are promising for optoelectronic applications. However, fundamental questions about the underlying chemistry, physics, and microstructure remain unanswered. More research will be required before any definitive statements can be conclusively made regarding the luminescence mechanism.
引用
收藏
页码:3046 / 3064
页数:19
相关论文
共 193 条
  • [41] INFLUENCE OF STRESS ON THE PHOTOLUMINESCENCE OF POROUS SILICON STRUCTURES
    FRIEDERSDORF, LE
    SEARSON, PC
    PROKES, SM
    GLEMBOCKI, OJ
    MACAULAY, JM
    [J]. APPLIED PHYSICS LETTERS, 1992, 60 (18) : 2285 - 2287
  • [42] STRUCTURED PHOTOLUMINESCENCE SPECTRUM IN LATERALLY ANODIZED POROUS SILICON
    FUJIWARA, Y
    NISHITANI, H
    NAKATA, H
    OHYAMA, T
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1992, 31 (12B): : L1763 - L1766
  • [43] QUANTUM SIZE EFFECTS ON THE OPTICAL AND ELECTRICAL-PROPERTIES OF MICROCRYSTALLINE SI-H
    FURUKAWA, S
    MIYASATO, T
    [J]. SUPERLATTICES AND MICROSTRUCTURES, 1989, 5 (03) : 317 - 320
  • [44] STRUCTURE AND BAND MODELS FOR WIDE OPTICAL GAP POLYSILANE ALLOYS
    FURUKAWA, S
    MATSUMOTO, N
    TAKEDA, K
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1985, 77-8 : 253 - 256
  • [45] VISIBLE ELECTROLUMINESCENCE FROM P-TYPE CRYSTALLINE SILICON POROUS SILICON N-TYPE MICROCRYSTALLINE SILICON CARBON PN JUNCTION DIODES
    FUTAGI, T
    MATSUMOTO, T
    KATSUNO, M
    OHTA, Y
    MIMURA, H
    KITAMURA, K
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1992, 31 (5B): : L616 - L618
  • [46] EVIDENCE FOR QUANTUM CONFINEMENT IN THE PHOTOLUMINESCENCE OF POROUS SI AND SIGE
    GARDELIS, S
    RIMMER, JS
    DAWSON, P
    HAMILTON, B
    KUBIAK, RA
    WHALL, TE
    PARKER, EHC
    [J]. APPLIED PHYSICS LETTERS, 1991, 59 (17) : 2118 - 2120
  • [47] MICROSTRUCTURAL INVESTIGATIONS OF LIGHT-EMITTING POROUS SI LAYERS
    GEORGE, T
    ANDERSON, MS
    PIKE, WT
    LIN, TL
    FATHAUER, RW
    JUNG, KH
    KWONG, DL
    [J]. APPLIED PHYSICS LETTERS, 1992, 60 (19) : 2359 - 2361
  • [48] EFFECT OF ELECTROCHEMICAL TREATMENTS ON THE PHOTOLUMINESCENCE FROM POROUS SILICON
    GOMYOU, H
    MORISAKI, H
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (09) : L86 - L88
  • [49] THE CHARACTERIZATION OF POROUS SILICON BY RAMAN-SPECTROSCOPY
    GOODES, SR
    JENKINS, TE
    BEALE, MIJ
    BENJAMIN, JD
    PICKERING, C
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1988, 3 (05) : 483 - 487
  • [50] HYDROGEN-TERMINATED SILICON SUBSTRATES FOR LOW-TEMPERATURE MOLECULAR-BEAM EPITAXY
    GRUNTHANER, PJ
    GRUNTHANER, FJ
    FATHAUER, RW
    LIN, TL
    HECHT, MH
    BELL, LD
    KAISER, WJ
    SCHOWENGERDT, FD
    MAZUR, JH
    [J]. THIN SOLID FILMS, 1989, 183 : 197 - 212