OBSERVATIONS ON THE OPERATION OF A PLANAR MAGNETRON SPUTTERING SYSTEM BY TARGET EROSION PATTERNS

被引：24

作者：

FUKAMI, T ^{[1
]}

SHINTANI, F ^{[1
]}

NAOE, M ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,FAC ENGN,MEGURO KU,TOKYO 152,JAPAN

来源：

关键词：

D O I：

10.1016/0040-6090(87)90136-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：373 / 381

页数：9

共 6 条

[1] CHAPMAN B, 1980, GLOW DISCHARGE PROCE, pCH6
[2] TARGET EROSION PATTERN IN PLANAR MAGNETRON SPUTTERING
FUKAMI, T
SAKUMA, T
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1982, 21 (12): : 1680 - 1683
[3] ELECTRON EFFECTS IN MAGNETRON SPUTTERING
GREEN, FA
CHAPMAN, BN
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01): : 165 - 168
[4] SELF-SPUTTERING PHENOMENA IN HIGH-RATE COAXIAL CYLINDRICAL MAGNETRON SPUTTERING
HOSOKAWA, N
TSUKADA, T
MISUMI, T
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 143 - 146
[5] VOSSEN JL, 1978, THIN FILM PROCESSE 2
[6] WAITS RK, 1976, J VAC SCI TECHNOL, V13, P179