PROPERTIES OF CHEMICAL VAPOR-DEPOSITED TETRAETHYLORTHOSILICATE OXIDES - CORRELATION WITH DEPOSITION PARAMETERS, ANNEALING, AND HYDROGEN CONCENTRATION

被引：30

作者：

NGUYEN, AM ^{[1
]}

MURARKA, SP ^{[1
]}

机构：

[1] RENSSELAER POLYTECH INST,CTR INTEGRATED ELECTR,DEPT MAT ENGN,TROY,NY 12181

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 03期

关键词：

D O I：

10.1116/1.585015

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：533 / 539

页数：7

共 12 条

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