CONTINUOUS OPTICAL MEASUREMENT OF THE DRY ETCHING OF SILICON USING THE DIFFRACTION OF A LAMELLAR GRATING

被引：10

作者：

MENDES, GF ^{[1
]}

CESCATO, L ^{[1
]}

FREJLICH, J ^{[1
]}

BRAGA, ES ^{[1
]}

MAMMANA, AP ^{[1
]}

机构：

[1] UNIV ESTADUAL CAMPINAS,FAC ENGN,ELECTR & DISPOSITIVOS LAB,BR-13100 CAMPINAS,SP,BRAZIL

来源：

关键词：

D O I：

10.1149/1.2113759

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：190 / 193

页数：4

共 9 条

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[2] BORN M, 1975, PRINCIPLES OPTICS, P61
[3] OPTICAL MONITORING OF THE ENDPOINT IN THIN-FILM PLASMA-ETCHING
BRAGA, ES
MENDES, GF
FREJLICH, J
MAMMANA, AP
[J]. THIN SOLID FILMS, 1983, 109 (04) : 363 - 369
[4] KLEINKNECHT HP, 1978, J ELECTROCHEM SOC, V125, P798, DOI 10.1149/1.2131551
[5] GRATINGS FOR METROLOGY AND PROCESS-CONTROL .2. THIN-FILM THICKNESS MEASUREMENT
MENDES, GF
CESCATO, L
FREJLICH, J
[J]. APPLIED OPTICS, 1984, 23 (04): : 576 - 583
[6] PLASMA-ETCHED DEPTH MEASUREMENT OF FILMS USING THE DIFFRACTION OF A LAMELLAR GRATING
MENDES, GF
CESCATO, L
FREJLICH, J
BRAGA, ES
MAMMANA, AP
[J]. THIN SOLID FILMS, 1984, 117 (02) : 107 - 116
[7] GRATINGS FOR METROLOGY AND PROCESS-CONTROL .1. A SIMPLE PARAMETER OPTIMIZATION PROBLEM
MENDES, GF
CESCATO, L
FREJLICH, J
[J]. APPLIED OPTICS, 1984, 23 (04): : 571 - 575
[8] A LASER INTERFEROMETER SYSTEM TO MONITOR DRY ETCHING OF PATTERNED SILICON
STERNHEIM, M
VANGELDER, W
HARTMAN, AW
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (03) : 655 - 658
[9] ELLIPSOMETRIC TABLES