RADIATION-INDUCED CHARGE TRANSPORT AND CHARGE BUILDUP IN SIO2-FILMS AT LOW-TEMPERATURES

被引：46

作者：

SROUR, JR ^{[1
]}

OTHMER, S ^{[1
]}

CURTIS, OL ^{[1
]}

CHIU, KY ^{[1
]}

机构：

[1] NORTHROP CORP,RES & TECHNOL CTR,HAWTHORNE,CA 90250

来源：

IEEE TRANSACTIONS ON NUCLEAR SCIENCE | 1976年 / 23卷 / 06期

关键词：

D O I：

10.1109/TNS.1976.4328531

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1513 / 1519

页数：7

共 21 条

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