VANDERWAALS BONDING OF GAAS ON PD LEADS TO A PERMANENT, SOLID-PHASE-TOPOTAXIAL, METALLURGICAL BOND

被引:71
作者
YABLONOVITCH, E [1 ]
SANDS, T [1 ]
HWANG, DM [1 ]
SCHNITZER, I [1 ]
GMITTER, TJ [1 ]
SHASTRY, SK [1 ]
HILL, DS [1 ]
FAN, JCC [1 ]
机构
[1] KOPIN CORP,TAUNTON,MA 02780
关键词
D O I
10.1063/1.105771
中图分类号
O59 [应用物理学];
学科分类号
摘要
Various forms of wafer bonding have now emerged as a serious competitor to heteroepitaxy for optoelectronic integration of dissimilar semiconductor materials. Among the types of wafer bonding, perhaps the most flexible is that which employs free-standing III-V films as created by epitaxial liftoff. For some purposes, weak Van der Waals forces provide an adequate bond between the native oxides of the III-V film and its new substrate. If the substrate is coated by palladium however, a low temperature solid-phase-topotaxial reaction occurs, producing oriented Pd4GaAs under the GaAs film. In effect, the topotaxy comes about through mechanical contact alone. The resulting metallurgical bond is an ohmic contact, a thermal contact and a robust, permanent, adherent contact.
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页码:3159 / 3161
页数:3
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