STUDIES OF SIOX ANODIC NATIVE OXIDE INTERFACES ON INSB

被引:20
作者
CALAHORRA, Z [1 ]
BREGMAN, J [1 ]
SHAPIRA, Y [1 ]
机构
[1] TEL AVIV UNIV,FAC ENGN,IL-69978 TEL AVIV,ISRAEL
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 05期
关键词
D O I
10.1116/1.583483
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1195 / 1202
页数:8
相关论文
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