INTERFACE STATE DENSITY AND OXIDE CHARGE MEASUREMENTS ON METAL-ANODIC-OXIDE-INSB SYSTEM

被引：29

作者：

ETCHELLS, A ^{[1
]}

FISCHER, CW ^{[1
]}

机构：

[1] UNIV GUELPH, DEPT PHYS, GUELPH N1G 2W1, ONTARIO, CANADA

来源：

JOURNAL OF APPLIED PHYSICS | 1976年 / 47卷 / 10期

关键词：

D O I：

10.1063/1.322386

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4605 / 4610

页数：6

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