SCALING PROPERTIES OF HIGH ELECTRON-MOBILITY TRANSISTORS

被引:28
作者
KIZILYALLI, IC
HESS, K
LARSON, JL
WIDIGER, DJ
机构
[1] CRAY RES INC, PROD DEV GRP, CHIPPEWA FALLS, WI 54729 USA
[2] IBM, DIV FED SYST, MANASSAS, VA 22110 USA
关键词
D O I
10.1109/T-ED.1986.22690
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1427 / 1433
页数:7
相关论文
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