SENSITIVITY IMPROVEMENT OF X-RAY RESIST BY OVERLAYING OXYGEN BLOCKING FILM

被引：2

作者：

MOCHIJI, K

SODA, Y

KIMURA, T

机构：

[1] Hitachi Ltd, Central Research Lab,, Tokyo, Jpn, Hitachi Ltd, Central Research Lab, Tokyo, Jpn

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 01期

关键词：

OXYGEN BLOCKING FILM - POSITIVE RESIST - SENSITIVITY CHANGES;

D O I：

10.1149/1.2108511

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：147 / 151

页数：5

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[4]

KIMURA T, 1983, P SOC PHOTO-OPT INST, V393, P2, DOI 10.1117/12.935087

[5] SPECTRAL SENSITIVITY OF RESIST BY X-RAY EXCITED ION MASS ANALYSIS [J].

MOCHIJI, K ;

KIMURA, T ;

OBAYASHI, H .

APPLIED PHYSICS LETTERS, 1985, 46 (04) :387-389

[6]

SHIRAISHI H, 1984, ACS S SERIES, V224, P168

[7]

WATTS RK, 1979, SOLID STATE TECHNOL, V22, P68

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