EFFECTS OF GRAIN-BOUNDARIES ON THE CHANNEL CONDUCTANCE OF SOI MOSFETS

被引:91
作者
FOSSUM, JG
ORTIZCONDE, A
机构
关键词
D O I
10.1109/T-ED.1983.21240
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:933 / 940
页数:8
相关论文
共 23 条
[1]   THRESHOLD VOLTAGE MODELS OF SHORT, NARROW AND SMALL GEOMETRY MOSFETS - A REVIEW [J].
AKERS, LA ;
SANCHEZ, JJ .
SOLID-STATE ELECTRONICS, 1982, 25 (07) :621-641
[2]   IV CHARACTERISTICS OF POLYCRYSTALLINE SILICON RESISTORS [J].
BACCARANI, G ;
IMPRONTA, M ;
RICCO, B ;
FERLA, P .
REVUE DE PHYSIQUE APPLIQUEE, 1978, 13 (12) :777-782
[3]   AN EXPERIMENTAL AND THEORETICAL-STUDY OF POLYCRYSTALLINE THIN-FILM TRANSISTOR [J].
BAUDRAND, H ;
HAMADTO, E ;
AMALRIC, JL .
SOLID-STATE ELECTRONICS, 1981, 24 (12) :1093-1098
[4]  
COLINGE JP, 1982, IEDM TECH DIG DEC
[5]  
DEPP SW, 1980, IEDM TECH DIG DEC
[6]   ANALYSIS OF MINORITY-CARRIER TRANSPORT IN POLYSILICON DEVICES [J].
FOSSUM, JG ;
SUNDARESAN, R .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (08) :1185-1197
[7]  
GAENSSLEN FH, 1975, IEDM TECH DIG DEC
[8]   ZONE-MELTING RECRYSTALLIZATION OF ENCAPSULATED SILICON FILMS ON SIO2 - MORPHOLOGY AND CRYSTALLOGRAPHY [J].
GEIS, MW ;
SMITH, HI ;
TSAUR, BY ;
FAN, JCC ;
MABY, EW ;
ANTONIADIS, DA .
APPLIED PHYSICS LETTERS, 1982, 40 (02) :158-160
[9]   ONE-GATE-WIDE CMOS INVERTER ON LASER-RECRYSTALLIZED POLYSILICON [J].
GIBBONS, JF ;
LEE, KF .
ELECTRON DEVICE LETTERS, 1980, 1 (06) :117-118
[10]  
HSING CT, 1979, PHYS STATUS SOLIDI A, V56, P129, DOI 10.1002/pssa.2210560113