SPUTTERING BEHAVIOR OF BORON USING ELECTRON-CYCLOTRON-RESONANCE PLASMA

被引：3

作者：

ITO, Y ^{[1
]}

KURIKI, S ^{[1
]}

SAIDOH, M ^{[1
]}

NISHIKAWA, M ^{[1
]}

机构：

[1] JAPAN ATOM ENERGY RES INST,NAKA FUS RES ESTAB,NAKA,IBARAKI 31101,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 10期

关键词：

ECR PLASMA; BORON SPUTTERING; BORON TEMPERATURE; BORON THIN FILM;

D O I：

10.1143/JJAP.33.5959

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Boron sputtering by plasma ions is investigated using electron cyclotron resonance (ECR) discharge of neon gas. The temperature of boron on an electrode during the discharge becomes high enough that the resistance of boron is sufficiently small in comparison with that of the plasma sheath in the application of negative voltage V. Ion current flowing from the plasma and the line emission from the sputtered boron are measured as a function of V under conditions of microwave input power 200-500 W and the neon gas pressure 1-10 mTorr. The sputtering yield at ion energy E=3 keV is about one order of magnitude larger than that at E=0.5 keV. Boron thin films are prepared by the sputtering method in the case of V=-2 kV. The deposition rate normalized by the ion current is about 100 Angstrom/s/A measured at a distance of about 2 cm from the boron surface.

引用

页码：5959 / 5966

页数：8

共 14 条

[1]

GOLDSMITH A, 1961, HDB THERMOPHYSICAL P, V1, P93

[2]

Gray D.E., 1972, AM I PHYS HDB, V3rd, P4

[3] SPUTTERING BEHAVIOR OF BORON AND BORON-CARBIDE [J].

HECHTL, E ;

MAZANEC, A ;

ECKSTEIN, W ;

ROTH, J ;

GARCIAROSALES, C .

JOURNAL OF NUCLEAR MATERIALS, 1992, 196 :713-716

[4] SOLID TARGET BORONIZATION IN THE TOKAMAK DE VARENNES - A TECHNIQUE FOR REAL-TIME BORONIZATION [J].

HIROOKA, Y ;

BOUCHER, C ;

CONN, RW ;

COUTURE, P ;

GREGORY, BC ;

KHANDAGLE, M ;

KNYSTAUTAS, E ;

MATSUDA, T ;

PAYNTER, RW ;

ROSS, GG ;

SOGABE, T ;

STANSFIELD, BL ;

ZUZAK, W .

NUCLEAR FUSION, 1992, 32 (11) :2029-2035

[5] ELECTRON-CYCLOTRON-RESONANCE DISCHARGE OF GAS SUBLIMATED FROM DECABORANE BY CO2-LASER IRRADIATION [J].

ITO, Y ;

TERASAWA, T ;

KANAZAWA, N ;

NISHIKAWA, M .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (11A) :5114-5121

[6]

KATO Y, 1994, IN PRESS REV SCI INS, V65

[7]

LOTZ W, 1967, IPP162 GARCH PLASM P

[8]

MEWE R, 1972, ASTRON ASTROPHYS, V20, P215

[9] ELECTRON-CYCLOTRON RESONANCE PLASMA DEPOSITION TECHNIQUE USING RAW-MATERIAL SUPPLY BY SPUTTERING [J].

ONO, T ;

TAKAHASHI, C ;

MATSUO, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (08) :L534-L536

[10] INITIAL BORONIZATION OF JT-60U TOKAMAK USING DECABORANE [J].

SAIDOH, M ;

OGIWARA, N ;

SHIMADA, M ;

ARAI, T ;

HIRATSUKA, H ;

KOIKE, T ;

SHIMIZU, M ;

NINOMIYA, H ;

NAKAMURA, H ;

JIMBOU, R ;

YAGYU, J ;

SUGIE, T ;

SAKASAI, A ;

ASAKURA, N ;

YAMAGE, M ;

SUGAI, H ;

JACKSON, GL .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (07) :3276-3281

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