学术探索
学术期刊
新闻热点
数据分析
智能评审
立即登录
HILLOCK GROWTH ON PB-IN-AU ALLOY-FILMS
被引:1
作者
:
ARAI, K
论文数:
0
引用数:
0
h-index:
0
ARAI, K
WAHO, T
论文数:
0
引用数:
0
h-index:
0
WAHO, T
机构
:
来源
:
THIN SOLID FILMS
|
1986年
/ 142卷
/ 01期
关键词
:
D O I
:
10.1016/0040-6090(86)90309-3
中图分类号
:
T [工业技术];
学科分类号
:
08 ;
摘要
:
引用
收藏
页码:139 / 144
页数:6
相关论文
共 8 条
[1]
GRAY DE, 1972, AM I PHYSICS HDB
[2]
STRESS IN FILMS OF SILICON MONOXIDE
HILL, AE
论文数:
0
引用数:
0
h-index:
0
HILL, AE
HOFFMAN, GR
论文数:
0
引用数:
0
h-index:
0
HOFFMAN, GR
[J].
BRITISH JOURNAL OF APPLIED PHYSICS,
1967,
18
(01):
: 13
-
&
[3]
INTERDIFFUSION-INDUCED SURFACE-MORPHOLOGY IN LEAD-ALLOY JOSEPHSON TUNNEL JUNCTION ELECTRODES
HUANG, HCW
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
HUANG, HCW
SCHAD, RG
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
SCHAD, RG
[J].
JOURNAL OF APPLIED PHYSICS,
1983,
54
(07)
: 3878
-
3885
[4]
HIGH-RELIABILITY PB-ALLOY JOSEPHSON-JUNCTIONS FOR INTEGRATED-CIRCUITS
HUANG, HCW
论文数:
0
引用数:
0
h-index:
0
HUANG, HCW
BASAVAIAH, S
论文数:
0
引用数:
0
h-index:
0
BASAVAIAH, S
KIRCHER, CJ
论文数:
0
引用数:
0
h-index:
0
KIRCHER, CJ
HARRIS, EP
论文数:
0
引用数:
0
h-index:
0
HARRIS, EP
MURAKAMI, M
论文数:
0
引用数:
0
h-index:
0
MURAKAMI, M
KLEPNER, SP
论文数:
0
引用数:
0
h-index:
0
KLEPNER, SP
GREINER, JH
论文数:
0
引用数:
0
h-index:
0
GREINER, JH
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1980,
27
(10)
: 1979
-
1987
[5]
THERMAL-STABILITY OF PB-ALLOY JOSEPHSON JUNCTION ELECTRODE MATERIALS .1. EFFECTS OF FILM THICKNESS AND GRAIN-SIZE OF PB-IN-AU BASE ELECTRODES
MURAKAMI, M
论文数:
0
引用数:
0
h-index:
0
MURAKAMI, M
[J].
JOURNAL OF APPLIED PHYSICS,
1981,
52
(03)
: 1309
-
1319
[6]
THERMAL-STABILITY OF PB-ALLOY JOSEPHSON JUNCTION ELECTRODE MATERIALS .2. EFFECTS OF SIO COATING ON PB-IN-AU BASE ELECTRODE
MURAKAMI, M
论文数:
0
引用数:
0
h-index:
0
MURAKAMI, M
[J].
JOURNAL OF APPLIED PHYSICS,
1981,
52
(03)
: 1320
-
1327
[7]
THERMAL STRAIN IN LEAD THIN-FILMS .2. STRAIN RELAXATION MECHANISMS
MURAKAMI, M
论文数:
0
引用数:
0
h-index:
0
MURAKAMI, M
[J].
THIN SOLID FILMS,
1978,
55
(01)
: 101
-
111
[8]
NAGATA K, 1985, IEEE ELECTRON DEVICE, V6, P95
←
1
→
共 8 条
[1]
GRAY DE, 1972, AM I PHYSICS HDB
[2]
STRESS IN FILMS OF SILICON MONOXIDE
HILL, AE
论文数:
0
引用数:
0
h-index:
0
HILL, AE
HOFFMAN, GR
论文数:
0
引用数:
0
h-index:
0
HOFFMAN, GR
[J].
BRITISH JOURNAL OF APPLIED PHYSICS,
1967,
18
(01):
: 13
-
&
[3]
INTERDIFFUSION-INDUCED SURFACE-MORPHOLOGY IN LEAD-ALLOY JOSEPHSON TUNNEL JUNCTION ELECTRODES
HUANG, HCW
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
HUANG, HCW
SCHAD, RG
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
SCHAD, RG
[J].
JOURNAL OF APPLIED PHYSICS,
1983,
54
(07)
: 3878
-
3885
[4]
HIGH-RELIABILITY PB-ALLOY JOSEPHSON-JUNCTIONS FOR INTEGRATED-CIRCUITS
HUANG, HCW
论文数:
0
引用数:
0
h-index:
0
HUANG, HCW
BASAVAIAH, S
论文数:
0
引用数:
0
h-index:
0
BASAVAIAH, S
KIRCHER, CJ
论文数:
0
引用数:
0
h-index:
0
KIRCHER, CJ
HARRIS, EP
论文数:
0
引用数:
0
h-index:
0
HARRIS, EP
MURAKAMI, M
论文数:
0
引用数:
0
h-index:
0
MURAKAMI, M
KLEPNER, SP
论文数:
0
引用数:
0
h-index:
0
KLEPNER, SP
GREINER, JH
论文数:
0
引用数:
0
h-index:
0
GREINER, JH
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1980,
27
(10)
: 1979
-
1987
[5]
THERMAL-STABILITY OF PB-ALLOY JOSEPHSON JUNCTION ELECTRODE MATERIALS .1. EFFECTS OF FILM THICKNESS AND GRAIN-SIZE OF PB-IN-AU BASE ELECTRODES
MURAKAMI, M
论文数:
0
引用数:
0
h-index:
0
MURAKAMI, M
[J].
JOURNAL OF APPLIED PHYSICS,
1981,
52
(03)
: 1309
-
1319
[6]
THERMAL-STABILITY OF PB-ALLOY JOSEPHSON JUNCTION ELECTRODE MATERIALS .2. EFFECTS OF SIO COATING ON PB-IN-AU BASE ELECTRODE
MURAKAMI, M
论文数:
0
引用数:
0
h-index:
0
MURAKAMI, M
[J].
JOURNAL OF APPLIED PHYSICS,
1981,
52
(03)
: 1320
-
1327
[7]
THERMAL STRAIN IN LEAD THIN-FILMS .2. STRAIN RELAXATION MECHANISMS
MURAKAMI, M
论文数:
0
引用数:
0
h-index:
0
MURAKAMI, M
[J].
THIN SOLID FILMS,
1978,
55
(01)
: 101
-
111
[8]
NAGATA K, 1985, IEEE ELECTRON DEVICE, V6, P95
←
1
→