STUDY OF TIN DIFFUSION INTO SILICON BY BACKSCATTERING ANALYSIS

被引：19

作者：

AKASAKA, Y

HORIE, K

NAKAMURA, G

TSUKAMOTO, K

YUKIMOTO, Y

机构：

[1] MITSUBISHI ELECT CORP, CENT RES LAB, MINAMISHIMIZU, AMAGASAKI 661, JAPAN

[2] MITSUBISHI ELEC CORP, KITAITAMI WORKS, MIZUHARA, ITAMI 664, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1974年 / 13卷 / 10期

关键词：

D O I：

10.1143/JJAP.13.1533

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1533 / 1540

页数：8

共 13 条

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[10] ANOMALOUS DIFFUSION OF PHOSPHORUS INTO SILICON [J].

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