A WAFER CHARGE-UP-REDUCING SYSTEM OF A HIGH-CURRENT ION IMPLANTER

被引:10
作者
HIGUCHI, T
SATO, M
TAMAI, T
机构
关键词
D O I
10.1016/0168-583X(89)90257-7
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
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页码:605 / 608
页数:4
相关论文
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