共 9 条
[1]
CLEMENTS RM, 1978, J VAC SCI TECHNOL, V15, P193, DOI 10.1116/1.569453
[2]
PRACTICAL LANGMUIR PROBE MEASUREMENTS IN DEPOSITION PLASMAS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1987, 5 (04)
:2273-2275
[3]
FELTS JM, IN PRESS
[5]
Langmuir I., 1923, GEN ELECTR REV, V26, P731
[6]
MEASUREMENTS OF HYDROGEN-ATOM DENSITY IN A Z-DISCHARGE PLASMA USING INTENSITIES OF H-ALPHA AND H-BETA LINES
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1986, 25 (10)
:1589-1593
[7]
DIAGNOSTIC METHODS FOR SPUTTERING PLASMAS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1978, 15 (02)
:188-192
[8]
WIESE WL, 1966, NAT STAND REF DATA S, V4, P11
[9]
VARIATION OF ION CURRENT FLOWING INTO DOUBLE PROBES WITH COATING OF ORGANIC THIN-FILM IN RF DISCHARGE PLASMA
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1987, 26 (05)
:728-733