THIN-FILMS OF MAGNESIUM-OXIDE PREPARED BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION

被引：21

作者：

ZHAO, YW

SUHR, H

机构：

[1] Department of Organic Chemistry, University Tübingen, Tübingen, W-7400

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1992年 / 54卷 / 05期

关键词：

52.90.+z; 68.55.-a; 81.15.Gh;

D O I：

10.1007/BF00324170

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films of magnesium oxide have been deposited on glass, quartz, stainless steel, and nickel by plasma enhanced chemical vapour deposition using 2,2,6,6-tetramethyl-heptanedionato-3,5-magnesium(II) (Mg(thd)2) as precursor. The films show (100)-orientation when deposited at temperatures greater-than-or-equal-to 673 K. The influence of experimental parameters on deposition rate and film properties has been studied.

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页码：451 / 454

页数：4

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