INTERFACIAL TRANSITION REGION BETWEEN SILICON AND ULTRATHIN PLASMA SI OXIDE

被引：4

作者：

ATANASSOVA, ED ^{[1
]}

SHOPOV, AV ^{[1
]}

机构：

[1] INST MICROELECTR, BU-1184 SOFIA, BULGARIA

来源：

APPLICATIONS OF SURFACE SCIENCE | 1983年 / 16卷 / 3-4期

关键词：

D O I：

10.1016/0378-5963(83)90082-X

中图分类号：

学科分类号：

摘要：

引用

页码：395 / 404

页数：10

共 39 条

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