ELECTRON-ENERGY LOSS AND AUGER-ELECTRON SPECTROSCOPY OF ULTRATHIN OXIDE-FILMS ON SILICON OBTAINED IN RF OXYGEN PLASMA

被引：12

作者：

ATANASOVA, ED ^{[1
]}

SHOPOV, AV ^{[1
]}

机构：

[1] INST MICROELECTR,SOFIA BU1184,BULGARIA

来源：

APPLIED SURFACE SCIENCE | 1982年 / 10卷 / 02期

关键词：

D O I：

10.1016/0378-5963(82)90148-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

收藏

页码：284 / 301

页数：18

相关论文

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