DYNAMICS OF METAL-SIOX AND SIOX-SI INTERFACES AND THE ASSOCIATED INSTABILITIES IN PRACTICAL METAL-INSULATOR SEMICONDUCTOR STRUCTURES

被引：5

作者：

RAJESWARAN, G ^{[1
]}

ANDERSON, WA ^{[1
]}

JACKSON, M ^{[1
]}

THAYER, M ^{[1
]}

机构：

[1] SUNY BUFFALO, DEPT ELECT & COMP ENGN, BUFFALO, NY 14226 USA

来源：

THIN SOLID FILMS | 1983年 / 104卷 / 3-4期

关键词：

D O I：

10.1016/0040-6090(83)90576-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：351 / 359

页数：9

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