RAPID THERMAL ANNEALING IN GAAS IC PROCESSING

被引：32

作者：

PEARTON, SJ

CUMMINGS, KD

VELLACOLEIRO, GP

机构：

来源：

关键词：

D O I：

10.1149/1.2113657

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2743 / 2748

页数：6

共 24 条

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