ELEMENTARY PROCESSES IN PLASMA-SURFACE INTERACTIONS WITH EMPHASIS ON IONS

被引:17
作者
ZALM, PC
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D O I
10.1351/pac198557091253
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O6 [化学];
学科分类号
0703 ;
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页码:1253 / 1264
页数:12
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[11]   ION-BEAM-ASSISTED ETCHING OF DIAMOND [J].
EFREMOW, NN ;
GEIS, MW ;
FLANDERS, DC ;
LINCOLN, GA ;
ECONOMOU, NP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :416-418
[12]  
HAGSTRUM HD, 1977, INELASTIC ION SURFAC, P1
[13]   THERMAL EFFECTS IN SPUTTERING [J].
KELLY, R .
SURFACE SCIENCE, 1979, 90 (02) :280-318
[14]  
KELLY R, 1983, RAD EFF, V80, P167
[15]   ON THE FLUENCE DEPENDENCE OF THE SPUTTERING YIELD FOR LOW-ENERGY NOBLE-GAS IONS [J].
KIRSCHNER, J ;
ETZKORN, HW .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1982, 29 (03) :133-139
[16]   STIMULATED DESORPTION [J].
KNOTEK, ML .
REPORTS ON PROGRESS IN PHYSICS, 1984, 47 (11) :1499-1561
[17]   ARGON-ION ASSISTED ETCHING OF SILICON BY MOLECULAR CHLORINE [J].
KOLFSCHOTEN, AW ;
HARING, RA ;
HARING, A ;
DEVRIES, AE .
JOURNAL OF APPLIED PHYSICS, 1984, 55 (10) :3813-3818
[18]  
KOLFSCHOTEN AW, UNPUB
[19]  
KOLFSCHOTEN AW, 1985, NUCL INSTR METH B, V7, P809
[20]  
KOLFSCHOTEN AW, 1984, J VAC SCI TECHNOL A, V2, P487